Field-rugged FTIR for in-situ monitoring of chemical vapor deposition (CVD)
May 6, 2024
Introduction
Monitoring of the chemical vapors during vapor deposition assures proper mixtures for consistent film growth. FTIR monitoring of the chemical vapors can provide instant feedback ensuring proper film composition. With a small footprint, high sensitivity and flexible optical configuration, the VIR-9000 can be used for monitoring the chemical vapor deposition process. The VIR-9000 series also includes a comprehensive software package for identification and quantitation of the chemical vapor composition.
Monitoring of chemical vapors
Light emission analysis
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Field-rugged FTIR for in-situ monitoring of chemical vapor deposition (CVD)
Introduction
Monitoring of the chemical vapors during vapor deposition assures proper mixtures for consistent film growth. FTIR monitoring of the chemical vapors can provide instant feedback ensuring proper film composition. With a small footprint, high sensitivity and flexible optical configuration, the VIR-9000 can be used for monitoring the chemical vapor deposition process. The VIR-9000 series also includes a comprehensive software package for identification and quantitation of the chemical vapor composition.